A comparative study of SiO2 deposited by PECVD and thermal method as passivation for multicrystalline silicon solar cells

Materials Science and Engineering: B

Volumn 165, Issue 1-2, 2009, Pages 64-66

  Panek, P ^a   Drabczyk, K ^a   Focsa, A ^b   Slaoui, A ^b  

^a INSTITUTE OF METALLURGY AND MATERIALS SCIENCE   (Poland)

^b CNRS   (France)

Author keywords

Silicon oxide; Solar cells; Surface passivation

Indexed keywords

OPEN CIRCUIT VOLTAGE; PASSIVATION; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICA; SILICON SOLAR CELLS; SILICON WAFERS; SOLAR POWER GENERATION; THERMOOXIDATION; TITANIUM DIOXIDE;

CHEMICAL VAPOR DEPOSITION METHODS; COMPARATIVES STUDIES; MULTI-CRYSTALLINE SILICON SOLAR CELLS; P-TYPE; SILICON DIOXIDE LAYERS; SURFACE PASSIVATION; SURFACE PASSIVATION EFFECTS; THERMAL; THERMAL METHODS; THERMAL OXIDATION PROCESS;

SILICON OXIDES;

EID: 71749092329     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2009.03.001     Document Type: Article

References (8)

1. Goetzberger A., Knobloch J., and Voss B. Crystalline Silicon Solar Cell (1998), J. Wiley & Sons, Chichester, England
2. Daliento S., Mele L., Bobeico E., et al. Sol. Energy Mater. Sol. Cells 91 (2007) 707-713
3. Cotter J.E., Richards B.S., Ferrazza F., et al. Proceedings of the 2nd WCEPSEC 1998. Vienna (1998) 1511-1514
4. Kropp J., Knobloch J., and Wettling W. Proceedings of the 11th EPSEC 1992. Montreux (1992) 49-52
5. Iacona F., Ceriola G., and La Via F. Mater. Sci. Semic. Proc. 4 (2001) 43-46
6. Ruby D.S., and Levine J.D. Proceedings of the 11th EPSEC 1992. Montreux (1992) 385-388
7. Żdanowicz T. Proceedings of the 12th EPSEC 1994. Amsterdam (1994) 1311-1314
8. Menna P., Di Francia G., and La Ferrara V. Sol. Energy Mater. Sol. Cells 37 (1995) 13-24