Amorphous TiPO films grown with four-component chemical vapor deposition

Materials Chemistry and Physics

Volumn 93, Issue 2-3, 2005, Pages 361-367

  Kuo, Dong Hau ^a   Tseng, Wen Cheng ^a  

^a NATIONAL DONG HWA UNIVERSITY   (Taiwan)

Author keywords

Chemical vapor deposition; Titanium phosphate; Titanium tetrachloride; Trimethyl phosphite

Indexed keywords

AMORPHOUS MATERIALS; CARBON DIOXIDE; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ELECTRIC CONDUCTIVITY; OXYGEN; PERMITTIVITY; PHOSPHORUS; RESIDUAL STRESSES; TITANIUM COMPOUNDS;

DEPOSITION TEMPERATURE; TITANIUM PHOSPHATE; TITANIUM TETRACHLORIDE; TRIMETHYL PHOSPHITE;

FILM GROWTH;

EID: 20844457086     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2005.03.023     Document Type: Article

References (14)

1. N. Imanaka, T. Masui, H. Hirai, and G. Adachi Chem. Mater. 15 2003 2289
2. S. Patoux, and C. Masquelier Chem. Mater. 14 2002 5057
3. V.N. Lebedev, N.A. Mel'nik, and A.V. Rudenko Radiochemistry 45 2003 149
4. G. Li, M. Nogami, and Y. Abe Solid State Ionics 83 1996 209
5. S.W. Martin J. Am. Ceram. Soc. 74 1991 1767
6. E. Fredriksson, and J.O. Carlsson Surf. Coat. Technol. 73 1995 160
7. V.J. Silvestri, C.M. Osburn, and D.W. Ormand J. Electrochem. Soc. 125 1978 902
8. C.S. Park, J.G. Kim, and J.S. Chun J. Vac. Sci. Technol. A 1 1983 1820
9. R. Tauber, A. Dumbri, and R. Caffrey J. Electrochem. Soc. 118 1971 747
10. D.H. Kuo, and C.N. Shueh Chem. Vap. Deposit. 9 2003 265
11. D.H. Kuo, and W.C. Tseng J. Non-Cryst. Solids 337 2004 115
12. M. Ohring The Materials Science of Thin Films 2nd ed. 2002 Academic Press New York p. 730
13. M. Ohring The Materials Science of Thin Films 2nd ed. 2002 Academic Press New York p. 383
14. J.P. Dekker, P.J. van der Put, H.J. Veringa, and J. Schoonman J. Electrochem. Soc. 141 1994 787