Deposition of Ta2O5/SiO2 multilayer films by a new process "injection MOCVD"

Thin Solid Films

Volumn 296, Issue 1-2, 1997, Pages 79-81

  Felten, F ^a   Senateur J P ^a   Labeau, M ^a   Yu Zhang, K ^b   Abrutis, A ^c  

^a Grenoble INP Phelma   (France)

^b UNIVERSITÉ GUSTAVE EIFFEL   (France)

^c VILNIUS UNIVERSITY   (Lithuania)

Author keywords

Injection MOCVD; Multilayers; Silicon dioxide; Tantalum pentoxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; SILICA; SUBSTRATES; SURFACE ROUGHNESS; TANTALUM COMPOUNDS; THERMAL EFFECTS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

INJECTION METALLORGANIC CHEMICAL VAPOR DEPOSITION; TANTALUM PENTOXIDE;

MULTILAYERS;

EID: 0031094439     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09351-0     Document Type: Article

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