Preparation and corrosion resistance of amorphous SiN x films from hexamethyldisiloxane solution by PECVD

Journal of the American Ceramic Society

Volumn 88, Issue 10, 2005, Pages 2966-2969

  Li, Y S ^a   Shimada, S ^a,b  

^a HOKKAIDO UNIVERSITY   (Japan)

^b AMERICAN CERAMIC SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COLUMNAR STRUCTURES; DEPOSITION RATES; HEXAMETHYLDISILOXANE; LIQUID INJECTION DEVICES;

AMORPHOUS MATERIALS; CORROSION RESISTANCE; DEPOSITION; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; STEEL; SYNTHESIS (CHEMICAL); THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON NITRIDE;

EID: 27644562345     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2005.00531.x     Document Type: Article

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