SCOPUS 정보 검색 플랫폼

Volumn 266, Issue 5-6, 2009, Pages 585-588

The influence of surface topography on the photocatalytic activity of electrophoretically deposited titanium dioxide thin films

(3) Toh, Alicia Guek Geok a Cai, Ruxiong b Butler, David Lee a,b

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY (Singapore)

Author keywords

AFM; ATR FTIR; EPD; Photocatalysis; Stearic acid; Surface topography

Indexed keywords

ACIDS; ATOMIC FORCE MICROSCOPY; CATALYSIS; CHEMICAL VAPOR DEPOSITION; ELECTRODEPOSITION; ELECTROPHORESIS; ENGINEERING GEOLOGY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NANOCRYSTALLINE MATERIALS; OXIDES; PHOTOCATALYSIS; STEARIC ACID; SURFACE MORPHOLOGY; SURFACE PROPERTIES; SURFACE ROUGHNESS; THIN FILMS; TITANIUM; TITANIUM DIOXIDE;

AFM; ATR-FTIR; COLLOIDAL SUSPENSIONS; CONDUCTIVE SURFACES; CVD METHODS; ELECTRO-PHORETIC DEPOSITIONS; EPD; FLAT SUBSTRATES; GRAIN SIZES; NANO-CRYSTALLINE; PHOTO-CATALYTIC; PHOTO-CATALYTIC ACTIVITIES; PHOTOCATALYTIC COATINGS; PHOTOCATALYTIC PROPERTIES; TITANIUM DIOXIDE THIN FILMS; ULTRA VIOLET IRRADIATIONS;

SURFACE TOPOGRAPHY;

EID: 60449102833 PISSN: 00431648 EISSN: None Source Type: Journal
DOI: 10.1016/j.wear.2008.04.075 Document Type: Article

Times cited : (16)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.