Electrical and corrosion properties of the Ti5Si3 thin films coated on glass substrate by APCVD method

Journal of Non-Crystalline Solids

Volumn 357, Issue 15, 2011, Pages 2802-2809

  Ren, Zhaodi ^a   Huang, Yanfei ^a,b   Shen, Mei ^a   Song, Chenlu ^a   Weng, Wenjian ^a   Han, Gaorong ^a   Ma, Ning ^a   Du, Piyi ^a,c  

^a ZHEJIANG UNIVERSITY   (China)

^b Hangzhou Iron and Steel Group Co   (China)

^c ZHEJIANG UNIVERSITY   (China)

Author keywords

Chemical vapor deposition; Coating glass; Electrochemical properties; Resistivity; Ti5Si3

Indexed keywords

ACID SOLUTIONS; ALKALI SOLUTIONS; APCVD METHOD; ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; COATING GLASS; CORROSION MECHANISMS; CORROSION PROPERTY; DEPOSITION TEMPERATURES; ELECTRICAL RESISTIVITY; GLASS SUBSTRATES; WEIGHT LOSS MEASUREMENTS;

ATMOSPHERIC PRESSURE; ATMOSPHERIC TEMPERATURE; CHEMICAL VAPOR DEPOSITION; CORROSION RATE; ELECTRIC CONDUCTIVITY; ELECTROCHEMICAL PROPERTIES; GLASS; SILICON; SUBSTRATES; THIN FILMS;

DEPOSITION;

EID: 79958795232     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2011.03.002     Document Type: Article

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