Characterization of mixed Ti/Al oxide thin films prepared by ion-beam-induced CVD

Applied Surface Science

Volumn 161, Issue 1, 2000, Pages 209-218

  Capitan M J ^a   Stabel, A ^b   Sanchez Lopez J C ^b   Justo, A ^b   Gonzalez Elipe A R ^b   Lefebvre, S ^c   Fernandez A ^b  

^a INSTITUTO DE ESTRUCTURA DE LA MATERIA   (Spain)

^b INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

^c UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; DIELECTRIC FILMS; ELECTRONIC DENSITY OF STATES; ION BEAMS; OPTICAL COATINGS; REFRACTIVE INDEX; SURFACE ROUGHNESS; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ION BEAM INDUCED CHEMICAL VAPOR DEPOSITION; MIXED OXIDE THIN FILMS;

THIN FILMS;

EID: 0034225453     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00293-2     Document Type: Article

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