Influence of Si content on Nano-structured Ti-Si-N films coated by pulsed-d.c. plasma enhanced CVD

Surface and Coatings Technology

Volumn 184, Issue 2-3, 2004, Pages 182-187

  Ma, Dayan ^a   Ma, Shengli ^a   Xu, Kewei ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

Amorphous phases; Micro hardness; Nanocomposite Ti Si N coatings; PECVD

Indexed keywords

AMORPHOUS SILICON; CHLORINE COMPOUNDS; MICROHARDNESS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; TITANIUM COMPOUNDS;

NANOCRYSTALLINE TIN FILMS; PULSED DIRECT CURRENT;

NANOSTRUCTURED MATERIALS;

COATING; HARDNESS; NANOSTRUCTURE; PLASMA;

EID: 2642573517     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.10.057     Document Type: Article

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