Ti-N, Ti-C-N, Ti-Si-N coatings obtained by APCVD at 650-800 °C

Applied Surface Science

Volumn 199, Issue 1-4, 2002, Pages 278-286

  Kuo, Dong Hau ^a   Liao, Wen Chieh ^a  

^a NATIONAL DONG HWA UNIVERSITY   (Taiwan)

Author keywords

Atmospheric pressure chemical vapor deposition; Coating; Ti C N; Ti N; Ti Si N

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; COMPOSITION; CRYSTAL STRUCTURE; GRAIN SIZE AND SHAPE; HARDNESS; MICROSTRUCTURE; TITANIUM COMPOUNDS;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION (APCVD);

PROTECTIVE COATINGS;

EID: 0037202071     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00869-3     Document Type: Article

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