Effect of NH3 on the preparation of TiNx films by laser CVD using tetrakis-diethylamido-titanium

Journal of Alloys and Compounds

Volumn 485, Issue 1-2, 2009, Pages 451-455

  Gong, Yansheng ^a   Tu, Rong ^a   Goto, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

LCVD; Microstructure; Preferred orientation; TDEAT; TiNx films

Indexed keywords

DEPOSITION TEMPERATURES; LASER CHEMICAL VAPOR DEPOSITION; LASER CVD; LASER POWER; LATTICE PARAMETERS; NON-ORIENTED; PREFERRED ORIENTATION; PREFERRED ORIENTATIONS; SINGLE PHASE; SOURCE MATERIAL; TDEAT; TETRAKIS;

CHEMICAL VAPOR DEPOSITION; DEPOSITION RATES; FILM PREPARATION; LASERS; TEXTURES; TITANIUM;

TITANIUM NITRIDE;

EID: 72049118706     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.05.137     Document Type: Article

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