Deposition of Ti-Al-N coatings by thermal CVD

International Journal of Refractory Metals and Hard Materials

Volumn 26, Issue 6, 2008, Pages 563-568

  Wagner, J ^a   Edlmayr, V ^a   Penoy, M ^b   Michotte, C ^b   Mitterer, C ^c   Kathrein, M ^d  

^a MATERIALS CENTER LEOBEN FORSCHUNG GMBH   (Austria)

^b CERATIZIT Luxembourg Sàrl ^*  (Luxembourg)

^c UNIVERSITY OF LEOBEN   (Austria)

^d CERATIZIT AUSTRIA GMBH   (Austria)

Author keywords

Aluminium nitride; CVD; Hardness; Structure; Ti Al N

Indexed keywords

ALUMINUM; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

ALUMINIUM NITRIDE; CVD; HARDNESS; STRUCTURE; THERMAL CVD; TI-AL-N; TI-AL-N COATINGS;

CHEMICAL VAPOR DEPOSITION;

EID: 48949100684     PISSN: 02634368     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijrmhm.2008.01.003     Document Type: Article

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