In situ studies on reaction mechanisms in atomic layer deposition

Critical Reviews in Solid State and Materials Sciences

Volumn 38, Issue 3, 2013, Pages 167-202

  Knapas, Kjell ^a   Ritala, Mikko ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

atomic layer deposition; in situ; infrared spectrometry; ligand exchange reaction; mass spectrometry; quartz crystal microbalance; reaction mechanism

Indexed keywords

COMBUSTION CHEMISTRY; IN-SITU INVESTIGATIONS; INFRARED SPECTROMETRY; LIGAND EXCHANGE REACTIONS; MICROELECTRONICS INDUSTRY; QUADRUPOLE MASS SPECTROMETRY; REACTION MECHANISM; THIN-FILM DEPOSITIONS;

BYPRODUCTS; CHEMICAL BONDS; DEPOSITION; FUNCTIONAL GROUPS; INFRARED SPECTROSCOPY; MASS SPECTROMETRY; MICROELECTRONICS; OXYGEN; QUARTZ CRYSTAL MICROBALANCES; SURFACE REACTIONS;

ATOMIC LAYER DEPOSITION;

EID: 84879570006     PISSN: 10408436     EISSN: 15476561     Source Type: Journal    
DOI: 10.1080/10408436.2012.693460     Document Type: Article

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