Infrared and near-infrared spectroscopic probing of atomic layer deposition processes

Journal of Molecular Structure

Volumn 976, Issue 1-3, 2010, Pages 324-327

  O'Mahony, A ^a   Pemble, M E ^a   Povey, I M ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

Atomic layer deposition; Infrared spectroscopy; Reaction mechanisms

Indexed keywords

ATOMIC LAYER; DIODE LASER SPECTROSCOPY; FTIR; GAS PHASE PRODUCTS; GAS-PHASE SPECIES; GASPHASE; IN-SITU; NEAR INFRARED; REACTION MECHANISM; REACTION MECHANISMS; REACTOR DYNAMICS; REAL TIME;

ATOMIC LAYER DEPOSITION; ATOMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; GAS DYNAMICS; GASES; HAFNIUM; HAFNIUM COMPOUNDS; INFRARED DEVICES; INFRARED LASERS; LASER SPECTROSCOPY; WAVELET TRANSFORMS;

ATOMIC SPECTROSCOPY;

EID: 77953711053     PISSN: 00222860     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.molstruc.2010.03.087     Document Type: Article

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