Reaction mechanism studies on titanium isopropoxide-water atomic layer deposition process

Chemical Vapor Deposition

Volumn 8, Issue 1, 2002, Pages 21-28

  Rahtu, Antti ^a   Ritala, Mikko ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

Atomic layer deposition (ALD); Mass spectrometry; Quartz crystal microbalance (QCM); Titanium dioxide

Indexed keywords

EID: 0002179435     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3862(20020116)8:1<21::AID-CVDE21>3.0.CO;2-0     Document Type: Article

References (55)