Atomic layer deposition in traveling-wave reactor: In situ diagnostics by optical reflection

Applied Surface Science

Volumn 112, Issue , 1997, Pages 82-86

  Rosental, A ^a   Adamson, P ^a   Gerst, A ^a   Koppel, H ^a   Tarre, A ^a  

^a INSTITUTE OF PHYSICS   (Estonia)

Author keywords

Atomic layer deposition; In situ diagnostics; Optical reflection; TiO 2 thin films; Traveling wave reactor

Indexed keywords

APPROXIMATION THEORY; CHEMICAL REACTORS; DIELECTRIC MATERIALS; FILM GROWTH; LIGHT REFLECTION; OPTICAL PROPERTIES; REAL TIME SYSTEMS; SUBSTRATES; SURFACES; THIN FILMS; TITANIUM DIOXIDE;

ATOMIC LAYER DEPOSITION; BREWSTER ANGLE INTERFEROMETRIC REFLECTANCE TECHNIQUES; DIELECTRIC REFLECTION; GROWTH RATE; IN SITU DIAGNOSTICS; SURFACE KINETICS; TRAVELLING WAVE REACTORS;

DEPOSITION;

EID: 0031547030     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)01003-3     Document Type: Article

References (5)

1. T. Suntola, in: Handbook of Crystal Growth, Vol. 6, ed. D.T.J. Hurle (Elsevier, Amsterdam, 1994) p. 601.
2. D.E. Aspnes, Mater. Sci. Eng. B 30 (1995) 109.
3. Y. Kobayashi and N. Kobayashi, Jpn. J. Appl. Phys. 33 (1994) 2463.
4. A. Rosental, P. Adamson, A. Gerst and A. Niilisk, Appl. Surf. Sci. 107 (1996) 178
5. M. Born and E. Wolf, Principles of Optics (Pergamon, London, 1968).