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Volumn 231, Issue 1-2, 2001, Pages 262-272

Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide

Author keywords

A1. Adsorption; A1. Crystal structure; A2. Characterization; A3. Atomic layer epitaxy; B1. Oxides; B2. Dielectric materials

Indexed keywords

DEPOSITION; FILM GROWTH; HYDROGEN PEROXIDE; SILICA; SILICON; SUBSTRATES; THICK FILMS; WATER; ZIRCONIA;

EID: 0035452393     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)01449-X     Document Type: Article
Times cited : (81)

References (50)
  • 37
    • 0004516920 scopus 로고    scopus 로고
    • Thesis, Dissert. Phys. Univ. Tartuensis
    • (1999) , vol.26
    • Kukli, K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.