Determination of growth parameters for atomic layer epitaxy using reflectance difference spectroscopy

Canadian Journal of Physics

Volumn 74, Issue , 1996, Pages

  Ares R ^a   Tran, C A ^a   Watkins, S P ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 3843049021     PISSN: 00084204     EISSN: None     Source Type: Journal    
DOI: 10.1139/p96-838     Document Type: Article

References (7)

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4. D.E. Aspnes, J.P. Harbison, A.A. Studna, and L.T. Florez. J. Vac. Sci. Technol. A, 6, 1327 (1988).
5. K. Hingerl, D.E. Aspnes, I. Kamiya, and L.T. Florez. Appl. Phys. Lett. 63, 885 (1993).
6. S.M. Scholz, A.B. Müller, W. Richter, D.R.T. Zahn, D.I. Westwood, D.A. Woolf, and R.H. Williams. J. Vac. Sci. Technol. B, 10, 1710 (1992).
7. R. Arès, C.A. Tran, and S.P. Watkins. Appl. Phys. Lett. 67, 1576 (1995).