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Chemistry of Materials

Volumn 12, Issue 11, 2000, Pages 3472-3480

Atomic layer deposition of SiO2 films on BN particles using sequential surface reactions

(3) Ferguson, J D a Weimer, A W a George, S M a

a UNIVERSITY OF COLORADO (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON DIOXIDE;

ARTICLE; CHEMICAL COMPOSITION; FOURIER TRANSFORMATION; PARTICULATE MATTER; REACTION ANALYSIS; SURFACE PROPERTY; THERMAL CONDUCTIVITY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0034511163 PISSN: 08974756 EISSN: None Source Type: Journal
DOI: 10.1021/cm000313t Document Type: Article

Times cited : (72)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.