In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3

Applied Physics Letters

Volumn 89, Issue 13, 2006, Pages

  Heil, S B S ^a   Kudlacek, P ^b   Langereis, E ^a   Engeln, R ^a   Van De Sanden, M C M ^a   Kessels, W M M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMISORPTION; CRYSTALS; LIGHT EMISSION; MASS SPECTROMETRY; PLASMA APPLICATIONS; QUARTZ;

ATOMIC LAYER DEPOSITION (ALD); OPTICAL EMISSION SPECTROSCOPY; PLASMA PULSES; QUARTZ CRYSTAL MICROBALANCE MEASUREMENTS;

ALUMINA;

EID: 33749239600     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2357886     Document Type: Article

References (18)

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