Reflection absorption infrared spectroscopy during atomic layer deposition of HfO 2 films from tetrakis(ethylmethylamido)hafnium and water

Applied Surface Science

Volumn 256, Issue 16, 2010, Pages 5035-5041

  Sperling, Brent A ^a   Kimes, William A ^a   Maslar, James E ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Atomic layer deposition; Hafnium dioxide; In situ diagnostics; Infrared spectroscopy

Indexed keywords

ATOMIC LAYER DEPOSITION; ATOMS; DECOMPOSITION; HAFNIUM OXIDES; INFRARED SPECTROSCOPY; OPTIMIZATION; REACTION KINETICS; SILICA;

DEPOSITION CONDITIONS; FIRST CYCLE; HAFNIUM DIOXIDE; METAL LAYER; PROBE SURFACE; REFLECTION ABSORPTION INFRARED SPECTROSCOPY; SITU DIAGNOSTICS; TETRAKIS(ETHYLMETHYLAMIDO)HAFNIUM;

WATER ABSORPTION;

EID: 77950916477     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.03.050     Document Type: Article

References (38)

1. Ritala M., and Leskelä M. Atomic layer deposition. In: Nalwa H.S. (Ed). Handbook of Thin Film Materials (2002), Academic Press, San Diego 103-159
2. Machida H., Kada T., Ishikawa M., Ogura A., and Ohshita Y. Jpn. J. Appl. Phys. Part 1 43 (2004) 966
3. Rushworth S.A., Smith L.M., Kingsley A.J., Odedra R., Nickson R., and Hughes P. Microelectron. Reliab. 45 (2005) 1000
4. Kukli K., Ritala M., Sajavaara T., Keinonen J., and Leskelä M. Chem. Vap. Deposition 8 (2002) 199
5. Kukli K., Pilvi T., Ritala M., Sajavaara T., Lu J., and Leskelä M. Thin Solid Films 491 (2005) 328
6. Ho M.T., Wang Y., Brewer R.T., Wielunski L.S., Chabal Y.J., Moumen N., and Boleslawski M. Appl. Phys. Lett. 87 (2005) 133103
7. Triyoso D., Liu R., Roan D., Ramon M., Edwards N.V., Gregory R., Werho D., Kulik J., Tam G., Irwin E., Wang X.D., La L.B., Hobbs C., Garcia R., Baker J., White B.E., and Tobin P. J. Electrochem. Soc. 151 (2004) F220
8. Aarik J., Aidla A., Kiisler A.A., Uustare T., and Sammelselg V. Thin Solid Films 340 (1999) 110
9. Bermudez V.M. J. Vac. Sci. Technol. A 10 (1992) 152
10. Frank M.M., Chabal Y.J., and Wilk G.D. Mater. Res. Soc. Symp. Proc. 745 (2003) N2.4.1
11. Klaus J.W., Ferro S.J., and George S.M. Thin Solid Films 360 (2000) 145
12. Kelly M.J., Han J.H., Musgrave C.B., and Parsons G.N. Chem. Mater. 17 (2005) 5305
13. Maslar J.E., Hurst W.S., Burgess D.R., Kimes W.A., Nguyen N.V., Moore E.F., and Hodges J.T. ECS Trans. 13 (2008) 139
14. Certain commercial equipment, instruments, and materials are identified in this publication to adequately specify the experimental procedure. Such identification in no way implies approval, recommendation, or endorsement by NIST, nor does it imply that the equipment, instruments, or materials identified are necessarily the best available for the purpose.
15. Greenler R.G. J. Chem. Phys. 44 (1966) 310
16. Herceg E., Celio H., and Trenary M. Rev. Sci. Instrum. 75 (2004) 2545
17. Langereis E., Keijmel J., de Sanden M.C.M.V., and Kessels W.M.M. Appl. Phys. Lett. 92 (2008) 231904
18. Morrow B.A., and Gay I.D. Infrared and NMR characterization of the silica surface. In: Papier E. (Ed). Adsorption on Silica Surfaces (2000), Marcel Dekker, New York 9-33
19. Socrates G. Infrared Characteristic Group Frequencies (1980), John Wiley & Sons, Chichester, UK
20. Kan B.C., Boo J.H., Lee I., and Zaera F. J. Phys. Chem. A 113 (2009) 3946
21. Boccuzzi F., Coluccia S., Ghiotti G., Morterra C., and Zecchina A. J. Phys. Chem. 82 (1978) 1298
22. Bouh A.O., Rice G.L., and Scott S.L. J. Am. Chem. Soc. 121 (1999) 7201
23. Elam J.W., Schuisky M., Ferguson J.D., and George S.M. Thin Solid Films 436 (2003) 145
24. van der Vis M.G.M., Konings R.J.M., Oskam A., and Walter R. J. Mol. Struct. 323 (1994) 93
25. Rodriguez-Reyes J.C.F., and Teplyakov A.V. J. Phys. Chem. C 111 (2007) 4800
26. Wang Y., Ho M.T., Goncharova L.V., Wielunski L.S., Rivillon-Amy S., Chabal Y.J., Gustafsson T., Moumen N., and Boleslawski M. Chem. Mater. 19 (2007) 3127
27. Pacchioni G., and Vitiello M. Phys. Rev. B 58 (1998) 7745
28. Pliskin W.A. J. Vac. Sci. Technol. 14 (1977) 1064
29. Beaudoin M., and Scott S.L. Organometallics 20 (2001) 237
30. Frank M.A., Sayan S., Dormann S., Emge T.J., Wielunski L.S., Garfunkel E., and Chabal Y.J. Mater. Sci. Eng. B 109 (2004) 6
31. Jobson E., Baiker A., and Wokaun A. J. Chem. Soc., Faraday Trans. 86 (1990) 1131
32. Liu D.F., Ma G., and Allen H.C. Environ. Sci. Technol. 39 (2005) 2025
33. Tsyganenko A.A., and Filimonov V.N. J. Mol. Struct. 19 (1973) 579
34. Morterra C., Cerrato G., Bolis V., and Fubini B. Spectrochim. Acta Part A 49 (1993) 1269
35. Gu W., and Tripp C.P. Langmuir 21 (2005) 211
36. O'Mahony A., Povey I.M., and Pemble M.E. ECS Trans. 16 (2008) 349
37. Jeong J.H., Lim S.W., and Yong K.J. Surf. Rev. Lett. 10 (2003) 121
38. Truong C.M., Chen P.J., Corneille J.S., Oh W.S., and Goodman D.W. J. Phys. Chem. 99 (1995) 8831