Surface of TiO2 during atomic layer deposition as determined by incremental dielectric reflection

Applied Surface Science

Volumn 142, Issue 1, 1999, Pages 204-209

  Rosental, A ^a   Tarre, A ^a   Adamson, P ^a   Gerst, A ^a   Kasikov, A ^a   Niilisk, A ^a  

^a UNIVERSITY OF TARTU   (Estonia)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; DEPOSITION; FILM GROWTH; MATHEMATICAL MODELS; OPTICAL VARIABLES MEASUREMENT; REFLECTION; SPECTROPHOTOMETRY; TITANIUM DIOXIDE;

ATOMIC LAYER DEPOSITION; IN SITU REAL TIME REFLECTANCE MEASUREMENT; INCREMENTAL DIELECTRIC REFLECTION;

SURFACE PROPERTIES;

EID: 0032651715     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00706-5     Document Type: Article

References (6)

1. Rosental A., Adamson P., Gerst A., Niilisk A. Appl. Surf. Sci. 107:1996;178.
2. Rosental A., Adamson P., Gerst A., Koppel H., Tarre A. Appl. Surf. Sci. 112:1997;82.
3. Rosental A., Tarre A., Gerst A., Adamson P., Sammelselg V., Uustare T. Proc. SPIE. 2967:1997;245.
4. T. Suntola, in: D.T.J. Hurle (Ed.), Handbook of Crystal Growth, Vol. 3, Elsevier, Amsterdam, 1994, p. 601.
5. M. Born, E. Wolf, Principles of Optics, Pergamon, London, 1968.
6. Konovalova O.P., Shaganov I.I. Sov. J. Opt. Technol. 55:1988;489.