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Chemistry of Materials

Volumn 20, Issue 10, 2008, Pages 3248-3250

Detection of a formate surface intermediate in the atomic layer deposition of high-k dielectrics using ozone

(4) Kwon, Jinhee c Dai, Min a Halls, Mathew D b Chabal, Yves J c

a RUTGERS UNIVERSITY (United States)

b ACCELRYS INC (United States)

c The University of Texas at Dallas (United States)

Author keywords

[No Author keywords available]

Indexed keywords

(1 1 0) SURFACE; ATOMIC LAYERS; HIGH K DIELECTRICS;

AIR POLLUTION; ALUMINUM; OZONE; PULSED LASER DEPOSITION;

ATOMIC LAYER DEPOSITION;

EID: 45749104689 PISSN: 08974756 EISSN: None Source Type: Journal
DOI: 10.1021/cm703667h Document Type: Article

Times cited : (56)

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