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Volumn 413, Issue 1-2, 2002, Pages 16-25

Atomic layer deposition of boron nitride using sequential exposures of BCl3 and NH3

Author keywords

Atomic layer deposition; Chemical vapor deposition; Fourier transform infrared (FTIR) spectroscopy

Indexed keywords

AMMONIA; BORON COMPOUNDS; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; ZIRCONIA;

EID: 0037166597     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00431-5     Document Type: Article
Times cited : (120)

References (40)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.