Infrared study of tris(dimethylamino)silane adsorption and ozone irradiation on Si(100) surfaces for ALD of SiO2

Electrochemical and Solid-State Letters

Volumn 10, Issue 10, 2007, Pages

  Kinoshita, Yuta ^a   Hirose, Fumihiko ^a,e   Miya, Hironobu ^b   Hirahara, Kazuhiro ^c   Kimura, Yasuo ^d   Niwano, Michio ^d,e  

^a YAMAGATA UNIVERSITY   (Japan)

^b HITACHI KOKUSAI ELECTRIC INC   (Japan)

^c SHIN ETSU CHEMICAL CO LTD   (Japan)

^d TOHOKU UNIVERSITY   (Japan)

^e ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROCARBONS; INFRARED RADIATION; IRRADIATION; SILICA;

MULTIPLE INTERNAL REFLECTION GEOMETRY; OZONE IRRADIATION; TRIS(DIMETHYLAMINO)SILANE ADSORPTION;

SILANES;

EID: 34547828174     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2763959     Document Type: Article

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