Quartz crystal microbalance studies of Al2O3 atomic layer deposition using trimethylaluminum and water at 125 °C

Journal of Physical Chemistry A

Volumn 114, Issue 3, 2010, Pages 1281-1289

  Wind, R A ^a,c   George, S M ^a,b  

^a UNIVERSITY OF COLORADO   (United States)

^b UCB 450   (United States)

^c Synkera Technologies   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALD GROWTH; BIOLOGICAL SUBSTRATES; DEHYDROXYLATIONS; LANGMUIR ADSORPTION ISOTHERMS; LIMITING VALUES; LOW TEMPERATURES; MASS GAIN; TRIMETHYLALUMINUM;

ADSORPTION; ALUMINUM; OXIDE MINERALS; PIEZOELECTRIC DEVICES; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; REACTION KINETICS; SURFACE REACTIONS;

THERMOANALYSIS;

ALUMINUM OXIDE; ORGANOMETALLIC COMPOUND; SILICON DIOXIDE; WATER;

ARTICLE; CHEMISTRY; CRYSTALLIZATION; TEMPERATURE;

ALUMINUM OXIDE; CRYSTALLIZATION; ORGANOMETALLIC COMPOUNDS; QUARTZ; TEMPERATURE; WATER;

EID: 77249175437     PISSN: 10895639     EISSN: 15205215     Source Type: Journal    
DOI: 10.1021/jp9049268     Document Type: Article

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