Conformal hydrophobic coatings prepared using atomic layer deposition seed layers and non-chlorinated hydrophobic precursors

Journal of Micromechanics and Microengineering

Volumn 15, Issue 5, 2005, Pages 984-992

  Herrmann, Cari F ^a,b   DelRio, Frank W ^a   Bright, Victor M ^a   George, Steven M ^a,b  

^a UCB 450   (United States)

^b UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CHEMICAL BONDS; CONTACT ANGLE; DEPOSITION; HYDROPHOBICITY; MICROELECTROMECHANICAL DEVICES; OPTIMIZATION; QUARTZ; RELIABILITY; SURFACE CHEMISTRY; ULTRATHIN FILMS; WATER;

ATOMIC LAYER DEPOSITION (ALD); CONFORMAL FILMS; HYDROPHOBIC COATINGS; HYDROPHOBIC PRECURSORS;

COATINGS;

EID: 24144500778     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/5/013     Document Type: Article

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