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Thin Solid Films

Volumn 292, Issue 1-2, 1997, Pages 135-144

Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry

(4) Ott, A W a Klaus, J W a Johnson, J M a George, S M a

a UNIVERSITY OF COLORADO (United States)

Author keywords

Aluminium oxide; Atomic force microscopy; Chemical vapour deposition; Ellipsometry

Indexed keywords

ALUMINUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; REFRACTIVE INDEX; SEMICONDUCTING SILICON; SUBSTRATES; SURFACE ROUGHNESS; SURFACES; THERMODYNAMIC STABILITY;

ALUMINUM OXIDE; SURFACE TOPOGRAPHY; TRIMETHYLALUMINUM;

THIN FILMS;

EID: 0031553497 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(96)08934-1 Document Type: Article

Times cited : (492)

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