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Chemistry of Materials

Volumn 13, Issue 1, 2001, Pages 122-128

Atomic layer deposition of tantalum oxide thin films from iodide precursor

(9) Kukli, K a Aarik, J a Aidla, A a Forsgren, K b Sundqvist, J b Harsta A b Uustare, T a Mandar H a Kiisler, A A a

a UNIVERSITY OF TARTU (Estonia)

b UPPSALA UNIVERSITY (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

IODIDE; OXIDE; TANTALUM;

ARTICLE; ATOMIC PARTICLE; CRYSTAL STRUCTURE; FILM; GROWTH RATE; PRECURSOR; ROENTGEN SPECTROSCOPY; TEMPERATURE DEPENDENCE;

EID: 0035115268 PISSN: 08974756 EISSN: None Source Type: Journal
DOI: 10.1021/cm001086y Document Type: Article

Times cited : (36)

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