Low-Temperature Al2O3 Atomic Layer Deposition

Chemistry of Materials

Volumn 16, Issue 4, 2004, Pages 639-645

  Groner, M D ^a   Fabreguette, F H ^a   Elam, J W ^a   George, S M ^a,b  

^a UNIVERSITY OF COLORADO   (United States)

^b University of Colorado at Boulder   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CRYSTAL GROWTH; DEPOSITION; LOW TEMPERATURE EFFECTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACE ROUGHNESS; VISCOUS FLOW;

QUARTZ CRYSTAL MICROBALANCE (QCM); SURFACE PROFILOMETRY;

ALUMINA;

ALUMINUM OXIDE; CARBON DIOXIDE; POLYETHYLENE TEREPHTHALATE; POLYMER;

ARTICLE; ATOMIC FORCE MICROSCOPY; DENSITY; ELECTRIC CAPACITANCE; ELLIPSOMETRY; FILM; GROWTH; LOW TEMPERATURE; OPTICAL ROTATION; TEMPERATURE SENSITIVITY;

EID: 1242320224     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm0304546     Document Type: Article

References (24)

1. Benmalek, M.; Dunlop, H. M. Surf. Coat. Technol. 1995, 77, 821.
2. Erlat, A. G.; Spontak, R. J.; Clarke, R. P.; Robinson, T. C.; Haaland, P. D.; Tropsha, Y.; Harvey, N. G.; Vogler, E. A. J. Phys. Chem. B 1999, 103, 6047.
3. Burrows, P. E.; Bulovic, V.; Forrest, S. R.; Sapochak, L. S.; McCarty, D. M.; Thompson, M. E. Appl. Phys. Lett. 1994, 65, 2922.
4. Weaver, M. S.; Michalski, L. A.; Rajan, K.; Rothman, M. A.; Silvernail, J. A.; Brown, J. J.; Burrows, P. E.; Graff, G. L.; Gross, M. E.; Martin, P. M.; Hall, M.; Mast, E.; Bonham, C.; Bennett, W.; Zumhoff, M. Appl. Phys. Lett. 2002, 81, 2929.
5. Klaus, J. W.; Sneh, O.; George, S. M. Science 1997, 278, 1934.
6. Klaus, J. W.; George, S. M. Surf. Sci. 2000, 447, 81.
7. Luo, Y.; Slater, D.; Han, M.; Moryl, J.; Osgood, R. M. Appl. Phys. Lett. 1997, 71, 3799.
8. Ritala, M.; Leskela, M. In Handbook of Thin Film Materials, Vol. 1; Nawla, H. S., Ed.; Academic Press: San Diego, CA, 2001.
9. Ott, A. W.; Klaus, J. W.; Johnson, J. M.; George, S. M. Thin Solid Films 1997, 292, 135.
10. Dillon, A. C.; Ott, A. W.; Way, J. D.; George, S. M. Surf. Sci. 1995, 322, 230.
11. Groner, M. D.; Elam, J. W.; Fabreguette, F. H.; George, S. M. Thin Solid Films 2002, 413, 186.
12. Yun, S. J.; Lee, K.; Skarp, J.; Kim, H.; Nam, K. J. Vac. Sci. Technol. A 1997, 15, 2993.
13. Matero, R.; Rahtu, A.; Ritala, M.; Leskela, M.; Sajavaara, T. Thin Solid Films 2000, 368, 1.
14. Kukli, K.; Ritala, M.; Leskela, M.; Jokinen, J. J. Vac. Sci. Technol. A. 1997, 15, 2214.
15. Fan, J.; Sugioka, K.; Toyoda, K. Jpn. J. Appl. Phys. 1991, 30, L1139.
16. Drozd, V. E.; Baraban, A. P.; Nikiforova, I. O. Appl. Surf. Sci. 1994, 82/83, 583.
17. Elam, J. W.; Groner, M. D.; George, S. M. Rev. Sci. Instrum. 2002, 73, 2981.
18. Elam, J. W.; Sechrist, Z. A.; George, S. M. Thin Solid Films 2002, 414, 43.
19. Grey, D. E., Coord. Ed. American Institute of Physics Handbook; American Institute of Physics: New York, 1982.
20. Weast, R. C., Ed. CRC Handbook of Chemistry and Physics; CRC Press: Boca Raton, FL, 1983-84.
21. Kattelus, H.; Ylilammi, M.; Saarilahti, J.; Antson, J.; Lindfors, S. Thin Solid Films 1993, 225, 296.
22. Kumagai, H.; Toyoda, K.; Matsumoto, M.; Obara, M. Jpn. J. Appl. Phys. 1993, 32, 6137.
23. Ritala, M.; Kukli, K.; Rahtu, A.; Raisanen, P. I.; Leskela, M.; Sajavaara, T.; Keinonen, J. Science 2000, 288, 319.
24. Chatham, H. Surf. Coat. Technol. 1996, 78, 1.