Evaluation of new aminoalkoxide precursors for atomic layer deposition. Growth of zirconium dioxide thin films and reaction mechanism studies

Chemistry of Materials

Volumn 16, Issue 26, 2004, Pages 5630-5636

  Matero, Raija ^a   Ritala, Mikko ^a   Leskelä, Markku ^a   Sajavaara, Timo ^a   Jones, Anthony C ^b,c   Roberts, John L ^b  

^a UNIVERSITY OF HELSINKI   (Finland)

^b UNIVERSITY OF LIVERPOOL   (United Kingdom)

^c Epichem Oxides and Nitrides   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BOROSILICATE GLASS; DECOMPOSITION; DEPOSITION; FILM GROWTH; HIGH TEMPERATURE EFFECTS; HYDROGEN; MASS SPECTROMETERS; QUARTZ; SURFACE REACTIONS; THIN FILMS; WATER;

AMINOALKOXIDES; ATOMIC LAYER DECOMPOSITION (ALD); QUADRUPOLE MASS SPECTROMETERS (QMS); QUATZ CRYSTAL MICROBALANCE (QCM);

ZIRCONIA;

DIMETHYL AMINOETHOXIDE; GLASS; HALIDE; HYDROGEN; OXIDE; SILICATE; SODIUM CARBONATE; UNCLASSIFIED DRUG; WATER; ZIRCONIUM OXIDE;

ARTICLE; ATOMIC LAYER DEPOSITION; CHEMICAL PROCEDURES; CHEMICAL REACTION; DECOMPOSITION; FILM; QUADRUPOLE MASS SPECTROMETRY; REACTION ANALYSIS; TEMPERATURE;

EID: 11144289175     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm030669f     Document Type: Article

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