Surface chemistry and infrared absorbance changes during ZnO atomic layer deposition on ZrO 2 and BaTiO 3 particles

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 1, 2005, Pages 118-125

  Ferguson, J D ^a   Weimer, A W ^b   George, S M ^a,b  

^a UNIVERSITY OF COLORADO   (United States)

^b University of Colorado   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; REACTION CYCLES; SEQUENTIAL EXPOSURES;

FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED RADIATION; SURFACE CHEMISTRY; VACUUM; WATER;

ZINC COMPOUNDS;

EID: 21744442608     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1821585     Document Type: Article

References (25)

1. M. A. Contreras, B. Egaas, K. Ramanathan, J. Hiltner, A. Swartzlander, F. Hasoon, and R. Noufi, Prog. Photovoltaics 7, 311 (1999).
2. Y. Li, G. S. Tompa, S. Liang, C. Gorla, Y. Lu, and J. Doyle, J. Vac. Sci. Technol. A 15, 1063 (1997).
3. M. Kawasaki, A. Ohtomo, I. Ohkubo, H. Koinuma, Z. K. Tang, P. Yu, G. K. L. Wong, B. P. Zhang, and Y. Segawa, Mater. Sci. Eng., B 56, 239 (1998).
4. P. Mitra, A. P. Chatterjee, and H. S. Maiti, Mater. Lett. 35, 33 (1998).
5. A. Yamada, B. S. Sang, and M. Konagai, Appl. Surf. Sci. 112, 216 (1997).
6. A. W. Ott and R. P. H. Chang, Mater. Chem. Phys. 58, 132 (1999).
7. E. B. Yousfi, J. Fouache, and D. Lincot, Appl. Surf. Sci. 153, 223 (2000).
8. N. Yamazoe, Sens. Actuators B 5, 7 (1991).
9. J. D. Ferguson, A. W. Weimer, and S. M. George, Thin Solid Films 413, 16 (2002).
10. T. H. Ballinger, J. C. S. Wong, and J. T. Yates, Langmuir 8, 1676 (1992).
11. J. D. Ferguson, E. R. Smith, A. W. Weimer, and S. M. George, J. Electrochem. Soc. 151, G528 (2004).
12. P. A. Agron, E. L. Fuller, and H. F. Holmes, J. Colloid Interface Sci. 52, 553 (1975).
13. W. Hertl, Langmuir 5, 96 (1989).
14. A. Trunschke, D. L. Hoang, and H. Lieske, J. Chem. Soc., Faraday Trans. 91, 4441 (1995).
15. M. Primet, P. Pichat, and M.-V. Mathieu, J. Phys. Chem. 75, 1216 (1971).
16. T. Noma, S. Wada, M. Yano, and T. Suzuki, J. Appl. Phys. 80, 5223 (1996).
17. Y. M. Artemev, S. V. Kurganov, and M. A. Artemeva, J. Appl. Chem. USSR 65, 1858 (1992).
18. A. A. Oleinik, V. A. Dodonov, G. N. Lysenko, and O. N. Druzhkov, Russ. Chem. Bull. 43, 1577 (1994).
19. M. I. Baraton and L. Merhari, Scr. Mater. 44, 1643 (2001).
20. M. I. Baraton, L. Merhari, H. Ferkel, and J. F. Castagnet, Mater. Sci. Eng., C 19, 315 (2002).
21. H. Dumont, A. Marbeuf, J. E. Bouree, and O. Gorochov, J. Mater. Chem. 2, 923 (1992).
22. H. Dumont, A. Marbeuf, J. E. Bouree, and O. Gorochov, J. Mater. Chem. 3, 1075 (1993).
23. H. T. Lam, N. Venkateswaran, and J. M. Vohs, Surf. Sci. 401, 34 (1998).
24. G. Kresse, O. Dulub, and U. Diebold, Phys. Rev. B 68, 245409 (2003).
25. M. Schuisky, J. W. Elam, and S. M. George, Appl. Phys. Lett. 81, 180 (2002).