Atomic layer deposition of tungsten using sequential surface chemistry with a sacrificial stripping reaction

Thin Solid Films

Volumn 360, Issue 1-2, 2000, Pages 145-153

  Klaus, J W ^a   Ferro, S J ^a   George, S M ^a  

^a UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; FILM GROWTH; FLUORINE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SILANES; SPECTROSCOPIC ANALYSIS; STRIPPING (REMOVAL); SURFACE CHEMISTRY; SURFACE TOPOGRAPHY; TEMPERATURE; TUNGSTEN;

ATOMIC LAYER DEPOSITION; BINARY REACTION; SEQUENTIAL SURFACE CHEMISTRY; SPECTROSCOPIC ELLIPSOMETRY;

THIN FILMS;

EID: 0034140916     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)01076-7     Document Type: Article

References (41)

1. The National Technology Roadmap for Semiconductors. 1997;SIA, 4300 Stevens Creek Boulevard, San Jose, CA 95129. (http://www.sematech.org/public/roadmap/index.htm).
2. Chang K.-M., Yeh T.-H., Deng I.-C., Shih C.-W. J. Appl. Phys. 82:1997;1469.
3. Yeh W.-K., Chen M.-C., Wang P.-J., Liu L.-M., Lin M.-S. Thin Solid Films. 270:1995;462.
4. Lu Z.H., Lockwood D.J., Baribeau J.M. Nature. 378:1995;258.
5. George S.M., Ott A.W., Klaus J.W. J. Phys. Chem. 100:1996;13121.
6. Suntola T. Thin Solid Films. 216:1992;84.
7. Ott A.W., Klaus J.W., Johnson J.M., George S.M. Thin Solid Films. 292:1996;135.
8. Kumagai H., Matsumoto M., Obara M., Suzuki M. Thin Solid Films. 263:1995;47.
9. Kumagai H., Toyoda K., Kobayashi K., Obara M., Iimura Y. Appl. Phys. Lett. 70:1997;2338.
10. Klaus J.W., Ott A.W., Johnson J.M., George S.M. Appl. Phys. Lett. 70:1997;1092.
11. Ritala M., Leskela M. Thin Solid Films. 225:1993;288.
12. Morishita S., Sugahara S., Matsumura M. Appl. Surf. Sci. 112:1997;198.
13. Klaus J.W., Ott A.W., Dillon A.C., George S.M. Surf. Sci. 418:1998;L14.
14. Han M., Luo Y., Moryl J.E., Chen J.G., Osgood R.M. Surf. Sci. 415:1998;251.
15. Ritala M., Saloniemi H., Leskela M., Prohaska T., Friedbacher G., Grasserbauer M. Thin Solid Films. 286:1996;54.
16. Ishii M., Iwai S., Kawata H., Ueki T., Aoyagi Y. J. Cryst. Growth. 180:1997;15.
17. Juppo M., Ritala M., Leskela M. J. Vac. Sci. Technol. 15:1997;2330.
18. Martensson P., Carlsson J. Chem. Vapor Deposition. 22:1997;333.
19. Gates S.M., Koleske D.D., Heath J.R., Copel M. Appl. Phys. Lett. 62:1993;510.
20. Takahashi Y., Ishii H., Fujinaga K. J. Electrochem. Soc. 136:1989;1826.
21. Ireland P.J. Thin Solid Films. 304:1997;1.
22. Kodas T., Hampden-Smith M. The Chemistry of Metal CVD. 1994;VCH, New York.
23. Bell D.A., McConica C.M., Baker K.L., Kuchta E. J. Electrochem. Soc. 143:1996;296.
24. Kobayashi N., Nakamura Y., Goto H., Homma Y. J. Appl. Phys. 73:1993;4637.
25. Kobayashi N., Goto H., Suzuki M. J. Appl. Phys. 69:1991;1013.
26. Yamamoto Y., Matsuura T., Murota J. Surf. Sci. 408:1998;190.
27. Dillon A.C., Robinson M.B., Han M.Y., George S.M. J. Electrochem. Soc. 139:1992;537.
28. Basu P., Ballinger T.H., Yates J.T. Jr. Rev. Sci. Instrum. 59:1988;1321.
29. Sneh O., Wise M.L., Ott A.W., Okada L.A., George S.M. Surf. Sci. 334:1995;135.
30. Gupta P., Colvin V.L., George S.M. Phys. Rev. 37:1988;8234.
31. Chabal Y.J., Raghavachari K. Phys. Rev. Lett. 54:1985;1055.
32. Nakamoto K. Infrared Spectra of Inorganic and Coordination Compounds. 1970;Wiley-Interscience, New York.
33. Palik E. Handbook of Optical Constants of Solids, Vol. 1. 1985;Academic, Orlando.
34. Dillon A.C., Ott A.W., Way J.D., George S.M. Surf. Sci. 322:1995;230.
35. Sneh O., George S.M. J. Phys. Chem. 99:1995;4639.
36. Umbach E., Menzel D. Surf. Sci. 135:1983;199.
37. Ingrey S., Johnson M., Streater R., Sproule G. J. Vac. Sci. Technol. 20:1982;968.
38. Chang K.M., Deng I.C., Lin H.Y. J. Electrochem. Soc. 146:1999;3092.
39. Chapman B.N. J. Vac. Sci. Technol. 11:1974;106.
40. Uhlir A. Bell Sys. Tech. 35:1956;333.
41. American Institute of Physics Handbook. Gray D.E. 3rd Edition :1982;McGraw-Hill, New York.