Growth kinetics and structure formation of ZrO2 thin films in chloride-based atomic layer deposition process

Thin Solid Films

Volumn 408, Issue 1-2, 2002, Pages 97-103

  Aarik, Jaan ^a   Aidla, Aleks ^a   Mändar, Hugo ^a   Uustare, Teet ^a   Sammelselg, Väino ^a  

^a UNIVERSITY OF TARTU   (Estonia)

Author keywords

Adsorption; Atomic layer deposition; Crystallization; Zirconium dioxide

Indexed keywords

ADSORPTION; CRYSTAL ORIENTATION; CRYSTALLIZATION; DEPOSITION; FILM GROWTH; PHASE COMPOSITION; POLYCRYSTALLINE MATERIALS; REFRACTIVE INDEX; SEMICONDUCTING SILICON; SILICA; SINGLE CRYSTALS; SUBSTRATES; ZIRCONIUM COMPOUNDS;

ATOMIC LAYER DEPOSITION; CRYSTALLINE FILMS;

THIN FILMS;

EID: 0037012516     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00123-2     Document Type: Article

References (26)