Surface reaction mechanisms during ozone-based atomic layer deposition of titanium dioxide

Journal of Physical Chemistry C

Volumn 112, Issue 26, 2008, Pages 9552-9554

  Rai, Vikrant R ^a   Agarwal, Sumit ^a  

^a Department of Geology and Geological Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION (ALD; ATOMIC LAYERS; SURFACE REACTION MECHANISMS;

ATOMIC PHYSICS; ATOMS; MECHANISMS; OZONE; PHYSICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION; SURFACE REACTIONS; TITANIUM; TITANIUM DIOXIDE;

ATOMIC LAYER DEPOSITION;

EID: 53549117718     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp8028616     Document Type: Article

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