In-situ probing of atomic layer deposition processes using infrared and near infrared spectroscopy

ECS Transactions

Volumn 16, Issue 4, 2009, Pages 349-354

  O'Mahony, A ^a   Povey, I M ^a   Pemble, M E ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATOMIC LAYER DEPOSITION; ATOMS; CHEMICAL VAPOR DEPOSITION; GASES; HAFNIUM OXIDES; LASER SPECTROSCOPY; NEAR INFRARED SPECTROSCOPY; SPECTROSCOPIC ANALYSIS;

CHEMICAL VAPOUR DEPOSITION; COMPLEX PROCESSES; GAS PHASE PRODUCTS; INFRARED AND NEAR-INFRARED SPECTROSCOPY; KINETICS AND MECHANISM; SPECTRAL FEATURE; SPECTROSCOPIC METHOD; TUNABLE DIODE LASER SPECTROSCOPY;

INFRARED DEVICES;

EID: 63149158625     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2980011     Document Type: Conference Paper

References (9)

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