Reaction mechanism studies on atomic layer deposition of Nb 2O5 from Nb(OEt)5 and water

Langmuir

Volumn 26, Issue 2, 2010, Pages 848-853

  Knapas, Kjell ^a,b   Rahtu, Antti ^a,b   Ritala, Mikko ^a,b  

^a UNIVERSITY OF HELSINKI   (Finland)

^b Vaisala O y J   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

2-PROPANOL; ADSORPTION OF ETHANOL; DECOMPOSITION REACTION; DEUTERATED WATER; DIETHYL ETHERS; ETHOXIDES; IN-SITU; IN-SITU MEASUREMENT; PROCESS PARAMETERS; QUADRUPOLE MASS SPECTROMETER; REACTION MECHANISM; REACTION TEMPERATURE;

ADSORPTION; ALUMINA; DEUTERIUM; ETHERS; MASS SPECTROMETRY; OXIDE MINERALS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES;

ETHANOL;

EID: 74249122465     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la902289h     Document Type: Article

References (20)

1. suntola, T.; Antson, J. U.S. Patent 4058430, 1977.
2. Ritala, M.; Leskelä, M. In Handbook of Thin Film. Materials; Nalva, H. S., Ed; Academic Press: San Diego, CA, 2001: Vol. 1, Chapter 1.
3. Leskelä, M.; Ritala, M. Angew. Chem., Int. Ed. 2003, 42, 5548.
4. Knapas, R.; Ritala, M. Chem. Mater. 2008, 20, 5698 and references therein.
5. Rnapas, K.; Rahtu, A.; Ritala, M. Chem. Vap. Deposition, in press, and references therein.
6. Elers, R.-E.; Ritala, M.; Leskelä, M,; Rauhala, E. Appl. Surf. Sci. 1994, 82/83, 468.
7. Kukli, K.; Ritala, M.; Leskelä, M.; Lappalainen, R. Chem. Vap. Deposition 1998, 4, 29.
8. Rahtu, A.; Kukli, K.; Ritala, M. Chem. Mater. 2001, 13, 817.
9. Ritala, M,; Juppo, M.; Rukli, K.; Rahtu, A.; Leskelä, M. J. Phys. IV 1999, 9, Pr8-1021.
10. Rahtu, A.; Ritala, M. Electrochem. Soc. Proc. 2000, 2000-13, 105.
11. DeCanio, E. C.; Nero, V. P.; Bruno, J. W. J. Catal. 1992, 135, 444.
12. Lusvardi, V. S.; Barteau, M. A.; Farneth, W. E. J. Catal. 1995, 153, 41.
13. DeCanio, E. C.; Nero, V. P.; Ko, E. I. J. Catal. 1994, 146, 317.
14. Yamashita, K.; Naito, S.; Tamara, K. J. Catal. 1985, 94, 353.
15. Hertl, W.; Cuenca, A. M. J. Phys. Chem. 1973, 77, 1120.
16. Hussein, G. A. M.; Sheppard, N.; Zaki, M. I.,; Fahim, R. B. J. Chem. Soc. Faraday Trans. I 1991, 87, 2661.
17. Rahtu, A. Atomic Layer Deposition of High Permittivity Oxides: Film Growth and In Situ Studies; Ph.D. Thesis; University of Helsinki: 2002; pp 43-44, thesis available at http://ethesis.helsinki.fi
18. Kim, K. S.; Barteau, M. A. Surf. Sci. 1989, 223, 13.
19. Matsushima, T.; White, J. M. J. Catal. 1976, 44, 183.
20. Rahtu, A.; Ritala, M. Chem. Vap. Deposition 2002, 8, 21.