Atomic layer deposition of ultrathin and conformal Al2O3 films on BN particles

Thin Solid Films

Volumn 371, Issue 1, 2000, Pages 95-104

  Ferguson, J D ^a   Weimer, A W ^b   George, S M ^a  

^a UNIVERSITY OF COLORADO   (United States)

^b UCB 450   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; BORON COMPOUNDS; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MOLECULAR VIBRATIONS; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION;

SEMICONDUCTING FILMS;

EID: 0033689223     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00973-1     Document Type: Article

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