메뉴 건너뛰기




Volumn 22, Issue 8, 2010, Pages 2517-2525

Atomic layer deposition of Ir-Pt alloy films

Author keywords

[No Author keywords available]

Indexed keywords

GROWTH MECHANISMS; GROWTH PER CYCLE; HIGH ASPECT RATIO; IN-SITU; LATTICE PARAMETERS; NEW OPPORTUNITIES; NOBLE METALS; NOBLE-METAL FILMS; NUCLEATION AND GROWTH; OTHER APPLICATIONS; OXYGEN CYCLE; PHASE ALLOYS; PT ALLOY; PT FILMS; QUADRUPOLE MASS SPECTROMETER; TRIMETHYL;

EID: 77951250075     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm9031978     Document Type: Article
Times cited : (83)

References (48)
  • 1
    • 36249028183 scopus 로고    scopus 로고
    • Synthesis and surface engineering of complex nanostructures by atomic layer deposition
    • Knez, M.; Niesch, K.; Niinisto, L. Synthesis and surface engineering of complex nanostructures by atomic layer deposition Adv. Mater. 2007, 19 (21) 3425-3438
    • (2007) Adv. Mater. , vol.19 , Issue.21 , pp. 3425-3438
    • Knez, M.1    Niesch, K.2    Niinisto, L.3
  • 5
    • 0028768378 scopus 로고
    • ALE of ZnS:Tb thin film electroluminescent devices
    • Kong, W.; Fogarty, J.; Solanki, R. ALE of ZnS:Tb thin film electroluminescent devices Appl. Phys. Lett. 1994, 65 (6) 670-672
    • (1994) Appl. Phys. Lett. , vol.65 , Issue.6 , pp. 670-672
    • Kong, W.1    Fogarty, J.2    Solanki, R.3
  • 9
    • 40049110891 scopus 로고    scopus 로고
    • Atomic layer deposition of indium tin oxide thin films using nonhalogenated precursors
    • Elam, J. W.; Baker, D. A.; Martinson, A. B. F.; Pellin, M. J.; Hupp, J. T. Atomic layer deposition of indium tin oxide thin films using nonhalogenated precursors J. Phys. Chem. C 2008, 112 (6) 1938-1945
    • (2008) J. Phys. Chem. C , vol.112 , Issue.6 , pp. 1938-1945
    • Elam, J.W.1    Baker, D.A.2    Martinson, A.B.F.3    Pellin, M.J.4    Hupp, J.T.5
  • 15
    • 0031546924 scopus 로고    scopus 로고
    • ALE of CdTe, MgTe and MnTe; Growth of CdTe/MnTe tilted superlattices on vicinal surfaces
    • Hartmann, J. M.; Charleux, M.; Mariette, H.; Rouviere, J. L. ALE of CdTe, MgTe and MnTe; growth of CdTe/MnTe tilted superlattices on vicinal surfaces Appl. Surf. Sci. 1997, 112, 142-147
    • (1997) Appl. Surf. Sci. , vol.112 , pp. 142-147
    • Hartmann, J.M.1    Charleux, M.2    Mariette, H.3    Rouviere, J.L.4
  • 16
    • 0031233751 scopus 로고    scopus 로고
    • ALE of AlP and its applications to X-ray multilayer mirror
    • Ishii, M.; Iwai, S.; Kawata, H.; Ueki, T.; Aoyagi, Y. ALE of AlP and its applications to X-ray multilayer mirror J. Cryst. Growth 1997, 180, 15-21
    • (1997) J. Cryst. Growth , vol.180 , pp. 15-21
    • Ishii, M.1    Iwai, S.2    Kawata, H.3    Ueki, T.4    Aoyagi, Y.5
  • 18
    • 0036647871 scopus 로고    scopus 로고
    • 3 nanolaminates fabricated by atomic layer deposition: Growth and surface roughness measurements
    • 3 Nanolaminates Fabricated by Atomic Layer Deposition: Growth and Surface Roughness Measurements Thin Solid Films 2002, 414, 43-55
    • (2002) Thin Solid Films , vol.414 , pp. 43-55
    • Elam, J.W.1    Sechrist, Z.A.2    George, S.M.3
  • 19
    • 0013326965 scopus 로고    scopus 로고
    • 5 films produced by atomic layer deposition: Temperature dependent dielectric spectroscopy and roomerature I-V characteristics
    • DOI 10.1063/1.1405837
    • 5 films produced by atomic layer deposition: Temperature dependent dielectric spectroscopy and room-temperature I - V characteristics J. Appl. Phys. 2001, 90 (9) 4532-4542 (Pubitemid 33598645)
    • (2001) Journal of Applied Physics , vol.90 , Issue.9 , pp. 4532-4542
    • Stromme, M.1    Niklasson, G.A.2    Ritala, M.3    Leskela, M.4    Kukli, K.5
  • 24
    • 0033688237 scopus 로고    scopus 로고
    • 1-x(x < 0.18) random and ordered alloys grown by metallorganic atomic layer epitaxy
    • 1-x (x < 0.18) random and ordered alloys grown by metallorganic atomic layer epitaxy J. Cryst. Growth 2000, 214, 460-464
    • (2000) J. Cryst. Growth , vol.214 , pp. 460-464
    • Song, J.H.1    Sim, E.D.2    Baek, K.S.3    Chang, S.K.4
  • 28
    • 33646391224 scopus 로고    scopus 로고
    • Plasma-enhanced atomic layer deposition of Ru-TiN thin films for copper diffusion barrier metals
    • Kwon, S. H.; Kwon, O. K.; Min, J. S.; Kang, S. W. Plasma-enhanced atomic layer deposition of Ru-TiN thin films for copper diffusion barrier metals J. Electrochem. Soc. 2006, 153 (6) G578-G581
    • (2006) J. Electrochem. Soc. , vol.153 , Issue.6
    • Kwon, S.H.1    Kwon, O.K.2    Min, J.S.3    Kang, S.W.4
  • 29
    • 65549119819 scopus 로고    scopus 로고
    • Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications
    • Kumar, S.; Greenslit, D.; Chakraborty, T.; Eisenbraun, E. T. Atomic layer deposition growth of a novel mixed-phase barrier for seedless copper electroplating applications J. Vacuum Sci. Technol. A 2009, 27 (3) 572-576
    • (2009) J. Vacuum Sci. Technol. A , vol.27 , Issue.3 , pp. 572-576
    • Kumar, S.1    Greenslit, D.2    Chakraborty, T.3    Eisenbraun, E.T.4
  • 31
    • 8444227118 scopus 로고    scopus 로고
    • Alloy catalysts designed from first principles
    • Greeley, J.; Mavrikakis, M. Alloy catalysts designed from first principles Nat. Mater. 2004, 3 (11) 810-815
    • (2004) Nat. Mater. , vol.3 , Issue.11 , pp. 810-815
    • Greeley, J.1    Mavrikakis, M.2
  • 32
    • 0037465334 scopus 로고    scopus 로고
    • 3 alloy films using atomic layer deposition techniques
    • 3 alloy films using atomic layer deposition techniques Chem. Mater. 2003, 15 (4) 1020-1028
    • (2003) Chem. Mater. , vol.15 , Issue.4 , pp. 1020-1028
    • Elam, J.W.1    George, S.M.2
  • 35
    • 0036685058 scopus 로고    scopus 로고
    • Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition
    • Elam, J. W.; Groner, M. D.; George, S. M. Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition Rev. Sci. Instrum. 2002, 73 (8) 2981-2987
    • (2002) Rev. Sci. Instrum. , vol.73 , Issue.8 , pp. 2981-2987
    • Elam, J.W.1    Groner, M.D.2    George, S.M.3
  • 36
    • 0041916147 scopus 로고    scopus 로고
    • Reaction mechanism studies on atomic layer deposition of ruthenium and platinum
    • Aaltonen, T.; Rahtu, A.; Ritala, M.; Leskela, M. Reaction mechanism studies on atomic layer deposition of ruthenium and platinum Electrochem. Solid State Lett. 2003, 6 (9) C130-C133
    • (2003) Electrochem. Solid State Lett. , vol.6 , Issue.9
    • Aaltonen, T.1    Rahtu, A.2    Ritala, M.3    Leskela, M.4
  • 39
    • 33746863663 scopus 로고    scopus 로고
    • 3 using cyclopentadienyl indium: A new synthetic route to transparent conducting oxide films
    • 3 using cyclopentadienyl indium: A new synthetic route to transparent conducting oxide films Chem. Mater. 2006, 18 (15) 3571-3578
    • (2006) Chem. Mater. , vol.18 , Issue.15 , pp. 3571-3578
    • Elam, J.W.1    Martinson, A.B.F.2    Pellin, M.J.3    Hupp, J.T.4
  • 40
    • 49349096167 scopus 로고    scopus 로고
    • Effect oxygen exposure on the quality of atomic layer deposition of ruthenium from bis(cyclopentadienyl)ruthenium and oxygen
    • Park, S. J.; Kim, W. H.; Maeng, W. J.; Yang, Y. S.; Park, C. G.; Kim, H.; Lee, K. N.; Jung, S. W.; Seong, W. K. Effect oxygen exposure on the quality of atomic layer deposition of ruthenium from bis(cyclopentadienyl)ruthenium and oxygen Thin Solid Films 2008, 516 (21) 7345-7349
    • (2008) Thin Solid Films , vol.516 , Issue.21 , pp. 7345-7349
    • Park, S.J.1    Kim, W.H.2    Maeng, W.J.3    Yang, Y.S.4    Park, C.G.5    Kim, H.6    Lee, K.N.7    Jung, S.W.8    Seong, W.K.9
  • 41
    • 20444380758 scopus 로고    scopus 로고
    • 4 sensors for gravimetric monitoring during atomic layer deposition at high temperatures
    • 4 sensors for gravimetric monitoring during atomic layer deposition at high temperatures Anal. Chem. 2005, 77 (11) 3531-3535
    • (2005) Anal. Chem. , vol.77 , Issue.11 , pp. 3531-3535
    • Elam, J.W.1    Pellin, M.J.2
  • 43
    • 34250375324 scopus 로고    scopus 로고
    • Properties of ultrathin platinum deposited by atomic layer deposition for nanoscale copper-metallization schemes
    • Zhu, Y.; Dunn, K. A.; Kaloyeros, A. E. Properties of ultrathin platinum deposited by atomic layer deposition for nanoscale copper-metallization schemes J. Mater. Res. 2007, 22 (5) 1292-1298
    • (2007) J. Mater. Res. , vol.22 , Issue.5 , pp. 1292-1298
    • Zhu, Y.1    Dunn, K.A.2    Kaloyeros, A.E.3
  • 45
    • 33846200857 scopus 로고    scopus 로고
    • Atomic layer deposition of Ru thin films using 2,4-(Dimethylpentadienyl) (ethylcyclopentadienyl)Ru by a liquid injection system
    • Kim, S. K.; Lee, S. Y.; Lee, S. W.; Hwang, G. W.; Hwang, C. S.; Lee, J. W.; Jeong, J. Atomic layer deposition of Ru thin films using 2,4-(Dimethylpentadienyl)(ethylcyclopentadienyl)Ru by a liquid injection system J. Electrochem. Soc. 2007, 154 (2) D95-D101
    • (2007) J. Electrochem. Soc. , vol.154 , Issue.2
    • Kim, S.K.1    Lee, S.Y.2    Lee, S.W.3    Hwang, G.W.4    Hwang, C.S.5    Lee, J.W.6    Jeong, J.7
  • 48
    • 0020762438 scopus 로고
    • Thermodynamic properties of binary-alloys of platinum metals. 2. Ir-Pt system
    • Tripathi, S. N.; Chandrasekharaiah, M. S. Thermodynamic Properties of Binary-Alloys of Platinum Metals. 2. Ir-Pt System J. Less-Common Met. 1983, 91 (2) 251-260
    • (1983) J. Less-Common Met. , vol.91 , Issue.2 , pp. 251-260
    • Tripathi, S.N.1    Chandrasekharaiah, M.S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.