Comparative study of low-temperature chloride atomic-layer chemical vapor deposition of TiO 2 and SnO 2

Applied Surface Science

Volumn 175-176, Issue , 2001, Pages 111-116

  Tarre, A ^a   Rosental, A ^a   Sammelselg, V ^a   Uustare, T ^a  

^a UNIVERSITY OF TARTU   (Estonia)

Author keywords

ALCVD ALE; Composition; Crystal structure; Incremental dielectric reflection; Surface morphology; Thin films

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CRYSTAL STRUCTURE; CRYSTALLIZATION; FILM GROWTH; LOW TEMPERATURE EFFECTS; MICROSCOPIC EXAMINATION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; THIN FILMS; TIN COMPOUNDS; TITANIUM DIOXIDE; ULTRAVIOLET SPECTROPHOTOMETERS;

ATOMIC LAYER CHEMICAL VAPOR DEPOSITION; ATOMIC LAYER EPITAXY;

CHEMICAL VAPOR DEPOSITION;

EID: 17944391887     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00051-4     Document Type: Article

References (10)

1. T. Suntola, in: D.T.J. Hurle (Ed.), Handbook of Crystal Growth, Vol. 3, Elsevier, Amsterdam, 1994, p. 601.
2. George S.M., Ott A.W., Klaus J.W. J. Phys. Chem. 100:1996;13121.
3. Rosental A., Adamson P., Gerst A., Niilisk A. Appl. Surf. Sci. 107:1996;178.
4. Rosental A., Adamson P., Gerst A., Koppel H., Tarre A. Appl. Surf. Sci. 112:1997;82.
5. Rosental A., Tarre A., Adamson P., Gerst A., Kasikov A., Niilisk A. Appl. Surf. Sci. 142:1999;204.
6. Ritala M., Leskelä M., Nykänen E., Soininen P., Niinistö L. Thin Solid Films. 225:1993;288.
7. Aarik J., Aidla A., Uustare T., Sammelselg V. J. Cryst. Growth. 181:1997;259.
8. Sammelselg V., Rosental A., Tarre A., Niinistö L., Heiskanan K., Ilmonen K., Johansson L.-S., Uustare T. Appl. Surf. Sci. 134:1998;78.
9. Viirola H., Niinistö L. Thin Solid Films. 249:1994;144.
10. Utriainen M., Kovács K., Campbell J.M., Niinistö L., Réti F. J. Electrochem. Soc. 146:1999;189.