Titanium isopropoxide as a precursor for atomic layer deposition: Characterization of titanium dioxide growth process

Applied Surface Science

Volumn 161, Issue 3, 2000, Pages 385-395

  Aarik, Jaan ^a   Aidla, Aleks ^a   Uustare, Teet ^a   Ritala, Mikko ^b   Leskelä, Markku ^b  

^a UNIVERSITY OF TARTU   (Estonia)

^b UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; COMPOSITION EFFECTS; DEPOSITION; FILM GROWTH; HYDROGEN PEROXIDE; QUARTZ APPLICATIONS; REACTION KINETICS; REFRACTIVE INDEX; THERMAL EFFECTS; THIN FILMS; VAPORS; WATER;

ATOMIC LAYER DEPOSITION; QUARTZ CRYSTAL MICROBALANCE (QCM); TITANIUM ISOPROPOXIDE;

TITANIUM DIOXIDE;

EID: 0034229297     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00274-9     Document Type: Article

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