SCOPUS 정보 검색 플랫폼

Volumn 246, Issue 1-3, 2005, Pages 250-261

Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides

(2) Van, Trinh T a Chang, Jane P a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

ALD; Atomic layer deposition; O radicals; Thin film; Diketonate

Indexed keywords

ACTIVATION ENERGY; ADSORPTION ISOTHERMS; CMOS INTEGRATED CIRCUITS; CRYSTALS; CURRENT DENSITY; ERBIUM COMPOUNDS; LEAKAGE CURRENTS; OXYGEN; QUARTZ; REACTION KINETICS; REFRACTIVE INDEX; SURFACE REACTIONS; THIN FILMS; WAVEGUIDES; YTTRIUM COMPOUNDS;

ATOMIC LAYER DEPOSITION (ALD); O RADICALS; QUARTZ CRYSTAL MICROBALANCE (QCM); Β-DIKETONATE;

KETONES;

EID: 17744381361 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2004.11.025 Document Type: Article

Times cited : (31)

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