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Volumn 95, Issue 14, 2009, Pages

Enhancing the nucleation of palladium atomic layer deposition on Al2 O 3 using trimethylaluminum to prevent surface poisoning by reaction products

(2) Goldstein, D N a George, S M a,b

a UNIVERSITY OF COLORADO (United States)

b University of Colorado at Boulder (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FORMALIN; HIGH GROWTH TEMPERATURES; HIGHER TEMPERATURES; REACTION PRODUCTS; SURFACE POISONING; SURFACE SITES; TRANSMISSION ELECTRON; TRIMETHYLALUMINUM;

ATOMIC LAYER DEPOSITION; FORMALDEHYDE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GROWTH TEMPERATURE; NUCLEATION; PALLADIUM; SPECTROSCOPIC ANALYSIS; SPECTROSCOPY; THERMOANALYSIS; TRANSMISSION ELECTRON MICROSCOPY;

SURFACE REACTIONS;

EID: 70349934313 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3238558 Document Type: Article

Times cited : (50)

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