Atomic layer epitaxy of vanadium oxide thin films and electrochemical behavior in presence of lithium ions

Electrochemical and Solid-State Letters

Volumn 3, Issue 10, 2000, Pages 485-488

  Badot, J C ^a,b   Ribes, S ^a   Yousfi, E B ^a   Vivier, V ^a   Pereira Ramos, J P ^a   Baffler, N ^a   Lincot, D ^a  

^a PSL RESEARCH UNIVERSITY   (France)

^b CNRS Université Paris Est Créteil Val de Marne   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; EPITAXIAL GROWTH; IONS; LITHIUM; VANADIUM COMPOUNDS;

ATOMIC LAYER EPITAXY;

THIN FILMS;

EID: 0034294316     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391187     Document Type: Article

References (10)

1. C. Julien, in Trends in Materials Science, S. Radhakrishna, Editor, p. 24, Narosa Publishing House, London (1996).
2. M. Baba, N. Kumagai, H. Kobayashi, O. Nakano, and K. Nishidate, Eleclrochem. Solid-State Leit.. 2, 320 (1999).
3. J. B. Baies, N. J. Dudney, D. C. Lubben, G. R. Gruzalski, B. S. Kwak, X. Yu, and R. A. Zhur, J. Paner Sources. 54, 58 (1995).
4. T. Sunlola, in Handbook of Crystal Growth, Vol. 3, Part B, D. T. J. Hurle, Editor, p. 601, Elsevier, Amsterdam (1994).
5. M. Vehamäki, T. Hatanpää, T. Hänninen, M. Ritala, and M. Leskelä, Electrochem. Solid-State Lett.. 2, 504 (1999).
6. P. Tätström, P. Martensson, U. Jansson, and J. O. Carlsson, J. Electrochem. Soc., 146,3139(1999).
7. D. Barreca, L. E. Depero, E. Franzato, G. A. Rizzi, L. Sangaletti, E. Tondello, and H. Vettori, J. Electrochem. Soc., 146,551 (1999), and references therein.
8. V. Vivier, J. Farcy, and J. P. Pereira-Ramos, Electrochim. Acta, 44, 831 (1998).
9. E. B. Yousfi, J. Fouache, and D. Lincot, Appl. Surf. Sei.. 153, 23 (2000).
10. C. Dclmas, H. Cognac-Auradou, J. M. Cociantelli, M. Ménétrier, and J. P. Doumere, Solid State Ionics. 69, 257 (1994).