TiO 2 thin films by atomic layer deposition: A case of uneven growth at low temperature

Applied Surface Science

Volumn 134, Issue 1-4, 1998, Pages 78-86

  Sammelselg, V ^a   Rosental, A ^a   Tarre, A ^a   Niinisto L ^b   Heiskanen, K ^c   Ilmonen, K ^c   Johansson, L S ^d   Uustare, T ^a  

^a UNIVERSITY OF TARTU   (Estonia)

^b Lab of Inorg and Analyt Chemistry   (Finland)

^c Lab Mech Proc Technol Recycling   (Finland)

^d AALTO UNIVERSITY   (Finland)

Author keywords

Amorphous and crystalline phases; Atomic force microscopy (AFM); Atomic layer deposition (ALD); Atomic layer epitaxy (ALE); In situ and ex situ characterization; TiO 2 thin films

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; DEPOSITION; EPITAXIAL GROWTH; FILM GROWTH; POLYCRYSTALLINE MATERIALS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; THIN FILMS; X RAY CRYSTALLOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC LAYER DEPOSITION (ALD); ATOMIC LAYER EPITAXY (ALE); OPTICAL INTERFERENCE TECHNIQUE; TITANIUM TETRACHLORIDE;

TITANIUM DIOXIDE;

EID: 0032166098     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00224-4     Document Type: Article

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