Etching of Nb2O5 thin films by NbCl5

Chemical Vapor Deposition

Volumn 15, Issue 10-12, 2009, Pages 269-273

  Knapas, Kjell ^a   Rahtu, Antti ^b   Ritala, Mikko ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b VAISALA OYJ   (Finland)

Author keywords

Etching; In situ; Mass spectrometry; Niobium oxide; QCM

Indexed keywords

IN-SITU; NIOBIUM OXIDES; NONUNIFORM; QUADRUPOLE MASS SPECTROMETER; THERMODYNAMIC DATA;

ETCHING; MASS SPECTROMETERS; MASS SPECTROMETRY; NIOBIUM; OXIDE MINERALS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; THIN FILMS;

NIOBIUM OXIDE;

EID: 73949100837     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200906795     Document Type: Article

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