Control of thin film structure by reactant pressure in atomic layer deposition of TiO2

Journal of Crystal Growth

Volumn 169, Issue 3, 1996, Pages 496-502

  Aarik, Jaan ^a   Aidla, Aleks ^a   Sammelselg, Väino ^b   Siimon, Hele ^a   Uustare, Teet ^a  

^a UNIVERSITY OF TARTU   (Estonia)

^b ESTONIAN ACADEMY OF SCIENCES   (Estonia)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ATOMIC STRUCTURE; CRYSTAL GROWTH; POLYCRYSTALLINE MATERIALS; TITANIUM DIOXIDE; VAPOR DEPOSITION; VAPOR PRESSURE;

ATOMIC LAYER DEPOSITION (ALD); ATOMIC LAYER GROWTH; POLYCRYSTALLINE FILMS;

THIN FILMS;

EID: 0030400393     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(96)00423-X     Document Type: Article

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