Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films

Thin Solid Films

Volumn 340, Issue 1, 1999, Pages 110-116

  Aarik, J ^a   Aidla, A ^a   Kiisler, A A ^a   Uustare, T ^a   Sammelselg, V ^a  

^a UNIVERSITY OF TARTU   (Estonia)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ATOMIC STRUCTURE; CRYSTAL STRUCTURE; DEPOSITION; FILM GROWTH; OPTICAL PROPERTIES; TEMPERATURE;

ATOMIC LAYER GROWTH; HAFNIUM OXIDES; SUBSTRATE TEMPERATURE;

HAFNIUM COMPOUNDS;

EID: 0032653080     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01356-X     Document Type: Article

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