Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems

Journal of Vacuum Science and Technology B

Volumn 29, Issue 6, 2011, Pages

  Melville, David O S ^a   Rosenbluth, Alan E ^a   Waechter, Andreas ^a   Millstone, Marc ^a   Tirapu Azpiroz, Jaione ^b   Tian, Kehan ^b   Lai, Kafai ^b   Inoue, Tadanobu ^b   Sakamoto, Masaharu ^b   Adam, Kostas ^c   Tritchkov, Alexander ^c  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM RESEARCH   (United States)

^c MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; VACUUM APPLICATIONS;

COMPUTATIONAL LITHOGRAPHIES; NUMERICAL APERTURE; PATTERNING PROCESS; PROJECTION LITHOGRAPHY; PROJECTION LITHOGRAPHY SYSTEMS; RESOLUTION LIMITS; SEMI-CONDUCTOR FABRICATION; SYSTEM OPTIMIZATIONS;

PHOTOLITHOGRAPHY;

EID: 84255194033     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3662090     Document Type: Article

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