Development of a computational lithography roadmap

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Chen, J Fung ^a   Liu, Hua Yu ^a   Laidig, Thomas ^a   Zuniga, Christian ^a   Cao, Yu ^a   Socha, Robert ^a  

^a ASML US Inc   (United States)

Author keywords

Computational lithography; Computational lithography roadmap; OPC; OPC models; RET

Indexed keywords

CADMIUM; CADMIUM COMPOUNDS; COMPUTATIONAL METHODS; MICROFLUIDICS; SPECIFICATIONS; TECHNOLOGY;

CD UNIFORMITY (CDU); FUNDAMENTAL COMPONENTS; MODEL OPC; OPTICAL MICRO LITHOGRAPHY; PHYSICAL LIMITS; RESOLUTION ENHANCEMENT TECHNOLOGIES (RET); ROAD MAPS;

LITHOGRAPHY;

EID: 45449096479     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773060     Document Type: Conference Paper

References (20)

1. Hua-yu Liu, Jiong Jiang, Qian Zhao, J. Fung Chen, Robert Socha, and Jo Finders, "Assessment of OPC model separability for computational lithography," to be published in Solid State Technology, April, 2008
2. Luoqi Chen, Yu Cao, Hua-yu Liu, Wenjin Shao, Mu Feng, and Jun Ye, "Predictive focus exposure modeling (FEM) for full-chip lithography," Proc. SPIE 6154 (2006)
3. Youping Zhang, Mu Feng, and Hua-yu Liu, "A focus exposure matrix model for full chip lithography manufacturability check and optical proximity correction," Proc. SPIE 6283 (2006)
4. Mark Terry, Gary Zhang, George Lu, Simon Chang, Tom Aton, Robert Soper, Mark Mason, Shane Best, Bill Dostalik, Stefan Hunsche, Jiang Wei Li, Rongchun Zhou, Mu Feng, and Jim Burdorf, "Process window and interlayer aware OPC for the 32-nm node," Proc. SPIE 6520 (2007)
5. Christian Zuniga and Edita Tejnil, "Heuristics for truncating the number of optical kernels in Hopkins image calculations for model-based OPC treatment," Proc. SPIE Vol. 6520 (2007)
6. Yu Cao, Yen-Wen Lu, Luoqi Chen, and Jun Ye, "Optimized hardware and software for fast full-chip simulation," Proc. SPIE 5754 (2004)
7. F.M. Schellenberg, T. Kingsley, N. Cobb, D. Dudau, R. Chalasani, J. McKibben and S. McPherson, "Accelerating DFM Electronic Data Processes using the Cell BE Microprocessor Architecture," IEEE Electronic Data Process (EDP) 2007 Workshop
8. Zongchang Yu, Youping Zhang, Yanjun Xiao, and Wanyu Li, "Production-worthy full chip image-based Verification," Proc. SPIE 6730 (2007)
9. Jungchul Park, Stephen Hsu, Douglas Van Den Broeke, J. Fung Chen, Mircea Dusa, Robert Socha, Jo Finders, Bert Vleeming, Anton van Oosten, Peter Nikolsky, Vincent Wiaux, Eric Hendrickx, Joost Bekaert, and Geert Vandenberghe, "Application challenges with double patterning technology (DPT) beyond 45 nm," Proc. SPIE Vol. 6349 (2006)
10. 1 ArF and EUV," Microlithography World, February 2008
11. Manish Chandhok, Sang H. Lee, Christof Krautschik, Bryan J. Rice, Eric Panning, Michael Goldstein, and Melissa Shell, "Determination of the flare specification and methods to meet the CD control requirements for the 32 nm node using EUVL," Proc. SPIE 5374 (2004)
12. Jonathan Cobb, Ruiqi Tian, Robert Boone, Kevin Lucas, Scott Hector, Vladimir Ivin, Mikhail Silakov, and George Babushkin, "Flare compensation in EUV lithography," 2003 EUV Symposium
13. F.M. Schellenberg, J, Word, and O. Toublan, "Layout compensation for EUV flare using comtemporary EDA software," 2004 EUV Symposium
14. Hans Meilinga, Vadim Banine, Peter KUrz, and Noreen Harnedc, "Progress in the ASML EUV program," Proc. SPIE 5374 (2004)
15. Hans Meilinga, Vadim Baninea, Noreen Hamed, Brian Blumb, Peter Kürze, and Henk Meijer, "Development of the ASML EUV alpha demo tool," Proc. SPIE 5751 (2005)
16. H. Meiling, H. Meijer, V. Banine, R. Moors, R. Groeneveld, H. J. Voorma, U. Mickan, B. Wolschrijn, B. Mertens, G. vanBaars, P. Kürz, and N. Harned, "First performance results of the ASML alpha demo tools", Proc. SPIE 6151 (2006)
17. Noreen Harned, Mieke Goethals, Rogier Groeneveld, Peter Kuerz, Martin Lowisch, Henk Meijer, Hans Meiling, Kurt Ronse, James Ryan, Michael Tittnich, Harm-Jan Voorma, John Zimmerman, Uwe Mickan, and Sjoerd Lok, "EUV lithography with the Alpha Demo Tools: status and challenges," Proc. SPIE 6517 (2007)
18. M. Shibuya, H. Ezaki, T. Fukui, N. Watanabe, A. Nishikata. "Random aberration and local flare," Proc. SPIE 5377 (2004)
19. Steve Hansen, ASML internal publications, 2008
20. Alfred K. Wong, "Resolution Enhancement Techniques in Optical Lithography," SPIE Press, 2001