Imaging performance optimization for hyper-NA scanner systems in high volume production

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Van De Kerkhof, Mark ^a   Van Setten, Eelco ^a   Engelen, Andre ^a   Plachecki, Vincent ^b   Liu, Hua Yu ^b   Schmitt Weaver, Emil ^b   Rooijakkers, Wilbert ^a   Simon, Klaus ^a  

^a ASML   (Netherlands)

^b ASML US Inc   (United States)

Author keywords

Hyper NA; Lithographic predictions; Low k1; Simulations

Indexed keywords

CO-OPTIMIZATION; CRITICAL DIMENSION UNIFORMITY (CDU); HIGH VOLUME MANUFACTURE (HVM); HIGH-VOLUME PRODUCTION; HYPER-NA; IMAGING PARAMETERS; IMAGING PERFORMANCE; IN-DEPTH UNDERSTANDING; LITHOGRAPHIC PROCESSING; LITHOGRAPHIC SYSTEMS; LITHOGRAPHIC TOOLS; MODEL BASED (OPC); OPTICAL LITHOGRAPHY; OPTICAL MICRO LITHOGRAPHY; SCANNER SYSTEMS; SYSTEM PERFORMANCES; VOLUME MANUFACTURING;

AEROSPACE APPLICATIONS; ARCHITECTURAL DESIGN; BUDGET CONTROL; COBALT; COBALT COMPOUNDS; COMPUTER NETWORKS; MULTITASKING; OPTIMIZATION; PHOTOLITHOGRAPHY; SCANNING; SODIUM; WELL STIMULATION;

OPTICAL SYSTEMS;

EID: 45449116318     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773260     Document Type: Conference Paper

References (6)

1. D. Flagello et al, "Optical lithography in the sub-50nm regime", Proceedings of SPIE, Vol. 5377 (2004)
2. B. Rijpers et al., "Impact of sampling on uncertainty", to be published in Proceedings of SPIE, (2008)
3. B. Geh at al., "The impact of projection lens polarization properties on lithographic process at hyper-NA", Proceedings of SPIE, vol.6520 (2007)
4. J. de Klerk et al., "Latest developments on immersion exposure systems", to be published in Proceedings of SPIE, (2008)
5. E. van Setten et al., "The Flash memory battle: How low can we go?", to be published in Proceedings of SPIE, (2008)
6. J. Finders et al. "Double patterning for 32 nm and below", to be published in Proceedings of SPIE, (2008)